Delta-doping of Semiconductors
| Author | : | |
| Rating | : | 4.35 (527 Votes) |
| Asin | : | 0521482887 |
| Format Type | : | paperback |
| Number of Pages | : | 616 Pages |
| Publish Date | : | 2013-02-14 |
| Language | : | English |
DESCRIPTION:
This book is the first to give a comprehensive review of the theory, fabrication, characterization, and device applications of abrupt, shallow, and narrow doping profiles in semiconductors. The latter part of the book deals with specific devices. After an introductory chapter sets out the basic theoretical and experimental concepts involved, the authors discuss the fabrication of abrupt and narrow doping profiles by several different techniques, including epitaxial growth. They then present the techniques for characterizing doping distributions, followed by several chapters on the inherent physical properties of narrow doping profiles. Doping profiles are a key element in the development of modern semicon